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CategoriesChemical Mechanical Planarization Cmp, Plasma Etching/Deposition, Material Flow Wafer-Level, Cleaning Equipment/Systems
EventsAPEX EXPO
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Products
Showing 1-2 of 2 products
No image Al-Specific Plasma Etching and Cleaning Machine
Equipment Features： By precisely monitoring and controlling the temperature ofeach individual electrode in the electrode array module, stableetching rates and high etching uniformity can be achieved. By monitoring…
No image PTH inline plasma glue removal processing system
Equipment characteristics： Automated PCB (Plasma+PTH) production process Innovated new processes (canceled partial or all Desmear production lines of PTH) Simplifying traditional processes into Plasma+PTH processes Realizing zero discharge…